Area selective atomic layer deposition of titanium dioxide: Effect of precursor chemistry
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Surface Acidity and Properties of TiO2/SiO2 Catalysts Prepared by Atomic Layer Deposition: UV−visible Diffuse Reflectance, DRIFTS, and Visible Raman Spectroscopy Studies
Highly uniform submonolayer to multilayer thin films of titanium dioxide supported on high surface area silica gel have been synthesized by atomic layer deposition (ALD) using titanium tetrachloride (TiCl4) and titanium isopropoxide (TTIP) as metal precursors. The deposition rate of titania films from TiCl4 was found to be stable in the 150-300 °C temperature range, which is slightly higher tha...
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